Hafnium nitride; Hafnium nitride HfN

Properties: gray powder, cubic crystal structure. Melting point 3310℃, microhardness 16GPa. Quite stable, but easy to aqua regia, concentrated sulfuric acid, hydrofluoric acid corrosion. High purity, small particle size, uniform distribution, large specific surface area, high surface activity, gray powder, cubic crystal structure. Microhardness 16GPa. Produced by a direct reaction of hafnium and nitrogen at 900℃, or by a reaction of hafnium halides and ammonia or a mixture of nitrogen and hydrogen. Hafnium alloy is an important component of refractory compound.

Product application:

Hafnium nitride has excellent mechanical, electrical, optical, high temperature and corrosion resistance characteristics, and has very important applications in the field of mechanical manufacturing and microelectronics. Hafnium nitride nanometer can be widely used in semiconductor, photoelectric and machining fields. Because of the integration of a variety of excellent mechanical, thermal, optical and corrosion wear resistance characteristics, the hafnium nitride nanometer film is expected to become an efficient optical window anti-reflection protection coating material, can be used in aerospace key optical devices. HfN is a new type of hard material with high melting point, high hardness, wear resistance and oxidation resistance. It can be used as protective layer for technical and decorative fields, abrasion resistant outer film for cutting tools, chemical inert film and high temperature resistant protective film.