Product Name: SiB6 (SiB6) 
Specification: 0.8-10um (D50) 
Appearance: Irregular 
Color: Black Grey 
Features: high transparency, low thermal expansion coefficient, good chemical stability, excellent thermal shock resistance and corrosion resistance, as well as good mechanical strength and electrical insulation performance, oxidation resistance, thermal shock resistance, and chemical erosion resistance 
Application: Abrasives and grinding, engineering materials, refractory materials and other fields

English name: Boron silica (B6Si); Boron silicide;  Silicon boride; 
CAS:12008-29-6 [1]  
Appearance: Black gray powder 
EINECS:234-535-8 
Molecular formula: B6Si 
Molecular weight: 92.952 
Relative density: 3.0g/cm3 
Melting point: 2200 ℃ 
Application of silicon hexaboride: 
B6Si can effectively promote the sintering of boron carbide ceramics and improve the mechanical properties of the material. 
2. Due to its heat resistance and high impact resistance, hexaborosilicate is relatively inexpensive and often used in resin grinding wheels as the main abrasive. As a P-type high-temperature thermoelectric material replacing boron carbide, it can be used as various standard abrasives and grinding hard alloys. It is also used as an engineering ceramic material, sandblasting nozzle, manufacturing blades and other shaped sintered parts and seals for gas engines. Used as an antioxidant for refractory materials. 
Explanation of SiB6: Chemical formula SiB6. Molecular weight 92.95. Black crystal. The relative density is 2.47. The hardness is between diamond and ruby. Can conduct electricity. Insoluble in water. Heating in chlorine gas and water vapor can oxidize the surface. It can be directly oxidized in boiling nitric acid. Unchanged in molten potassium hydroxide. And it decomposes in hot concentrated sulfuric acid. Explanation of production terms: A mixture of silicon and boron can be directly heated, excess silicon can be removed using hydrofluoric acid and nitric acid, and then the mixture can be decomposed into silicon triboride (B3Si) using molten potassium hydroxide. The SiB6 crystal structure consists of interconnected icosahedral (20 sided polyhedron), icosahedral hexahedron (26 sided polyhedron), and isolated silicon and boron atoms. Due to the size mismatch between silicon and boron atoms, silicon can be used instead of boron in the B12 icosahedron until the ultimate stoichiometric ratio corresponding to SiB2.89 is reached. 
High purity silicon hexaboride process: 
A low-cost and high-purity process for producing silicon hexaboride, in which boron trioxide and potassium borohydride are ball milled and mixed under argon protection, pressed into blocks, loaded into a vacuum carbon tube furnace, evacuated, and kept at 750 ℃ for 5 hours; Raise the temperature to 1250 ℃, continue to maintain the temperature until the furnace pressure is slightly positive, and the reduction reaction is completely completed. The mixture of monomer boron and potassium hydroxide obtained in the graphite crucible is heated and cleaned in distilled water, dried, and boron powder is obtained; After ball milling and mixing boron powder and silicon powder, they are loaded into a self propagating combustion reactor. The reactor is evacuated to a vacuum degree of 1 Pa, and the tungsten wire is heated by electricity to ignite the zirconium powder for high-temperature self propagating combustion reaction. After the reaction is completed, the temperature is reduced, impurities are removed, and high-purity hexaborosilicate is obtained Using boron trioxide and potassium borohydride as raw materials, the raw material cost is relatively low, and the entire process is reasonable and controllable. The purity of the produced silicon hexaboride is 99.5%, which is suitable for industrial production.