English Name: magnesium silicide

Chemical formula: Mg2Si

Molecular weight: 76.71

CAS：22831-39-6

Melting point: 1102 ℃

Magnesium silicide 

chemical formula: Mg2Si 

Molecular weight: 76.695 

Melting point: 1102 ℃ 

Density: 1.94 g/cm ³ 

Molar mass: 76.7 g · mol 

CAS login number: 22831-39-6 

EINECS login number: 245-154-5 

Production process: 

1. Direct melting method, which is a commonly used synthesis method, involves melting magnesium and silicon powder at high temperature without mixing, and then rapidly cooling to obtain Mg2Si. 

2. Mechanical alloying method, which involves ball milling and mixing magnesium and silicon powders in a high-energy ball mill, followed by hot pressing or heat treatment to obtain Mg2Si. 

3. Gas deposition method, in a gas phase reaction furnace, precursor compounds of magnesium and silicon (such as magnesium chloride and silane) are transported to the deposition chamber for gas phase reaction under high temperature conditions to generate Mg2Si thin films or powders. 

Purpose: 

1. Optoelectronic and energy devices: Magnesium silicide, as a narrow bandgap n-type semiconductor material, has important application prospects in the fields of optoelectronic and energy devices. 

2. Laser technology: Magnesium silicide is also used in laser technology, and its application in semiconductor manufacturing and other fields indicates its value in high-tech fields. 

3. Semiconductor Manufacturing: Magnesium silicide is also used in semiconductor manufacturing, and its semiconductor properties make it play an important role in these fields. 

Packaging and storage: This product is packaged in an inert gas filled plastic bag, sealed and stored in a dry and cool environment. It should not be exposed to air to prevent moisture from causing oxidation and aggregation, which may affect dispersion performance and usage effectiveness; The packaging quantity can be provided in separate packages according to customer requirements.